Title
Determination of the atomic structure of inversion domain boundaries in α-GaN by transmission electron microscopy
Date Issued
01 January 1998
Access level
metadata only access
Resource Type
journal article
Author(s)
Abstract
Transmission electron microscopy is used to investigate the structure of inversion domain boundaries in α-GaN (0001) films grown by metal-organic chemical vapour deposition on sapphire substrates. Convergent-beam electron diffraction is used to establish the existence of inversion domains with (1010) boundaries. Displacement fringes observed in two-beam images recorded from inclined inversion domain boundaries are compared with dynamical simulations. It is shown that the results are consistent with an atomic model in which fourfold bonding is preserved with all bonds being of the Ga-N type. The significance of the results for understanding the electronic properties of GaN is briefly discussed. © 1998 Taylor and Francis Group, LLC.
Start page
273
End page
286
Volume
77
Issue
1
Language
English
OCDE Knowledge area
Física atómica, molecular y química
Scopus EID
2-s2.0-0039573741
Source
Philosophical Magazine A: Physics of Condensed Matter, Structure, Defects and Mechanical Properties
ISSN of the container
01418610
Sources of information:
Directorio de Producción Científica
Scopus