Title
Misfit strain relaxation by stacking fault generation in InGaN quantum wells grown on m-plane GaN
Date Issued
01 April 2009
Access level
metadata only access
Resource Type
journal article
Author(s)
Fischer A.M.
Wu Z.
Sun K.
Wei Q.
Huang Y.
Senda R.
Iida D.
Iwaya M.
Amano H.
Abstract
InGaN quantum wells, grown on non-polar m-plane GaN and emitting light at 560 nm, experience lattice mismatch strain relaxation by the generation of stacking faults. Each stacking fault terminates a basal plane from the substrate side, generating misfit dislocations that have a Burgers vector with a 1/2[0001] component. The structural and optical properties of such thin film structures are reported. © 2009 The Japan Society of Applied Physics.
Start page
0410021
End page
0410023
Volume
2
Issue
4
Language
English
OCDE Knowledge area
Física de partículas, Campos de la Física
Scopus EID
2-s2.0-64749095963
Source
Applied Physics Express
ISSN of the container
18820778
Sources of information: Directorio de Producción Científica Scopus