Title
On the origin of the below band-gap absorption bands in n-type (N) 4H- and 6H-SiC
Date Issued
01 January 2004
Access level
metadata only access
Resource Type
conference paper
Author(s)
Wellmann P.J.
Winnacker A.
University of Erlangen-Nuremberg
Publisher(s)
Trans Tech Publications Ltd
Abstract
The dopant concentration dependence of the below band-gap absorption bands at room temperature in n-type (N) 4H- and 6H-SiC are investigated. The occupation of the nitrogen donors are determined from temperature dependent Hall effect measurements. In combination with the strength of the absorption bands the cross sections of these transitions are obtained. It is shown that the below band-gap absorption bands may be attributed to the inequivalent lattice sites of the nitrogen donor, i.e. the transition is defect-like with different initial states of the nitrogen donors and a common final state in the conduction band.
Start page
645
End page
648
Volume
457-460
Issue
I
Language
English
OCDE Knowledge area
Ingeniería de materiales
Scopus EID
2-s2.0-8744240410
Source
Materials Science Forum
ISSN of the container
02555476
Conference
Proceedings of the 10th International Conference on Silicon Carbide and Related Materials, ICSCRM 2003
Sources of information: Directorio de Producción Científica Scopus