Title
Chemical interaction at the buried silicon/zinc oxide thin-film solar cell interface as revealed by hard X-ray photoelectron spectroscopy
Date Issued
01 October 2013
Access level
open access
Resource Type
journal article
Author(s)
Wimmer M.
Gerlach D.
Wilks R.G.
Scherf S.
Félix R.
Lupulescu C.
Ruske F.
Schondelmaier G.
Lips K.
Hüpkes J.
Gorgoi M.
Eberhardt W.
Bär M.
Helmholtz-Zentrum Berlin für Materialien und Energie
Abstract
Hard X-ray photoelectron spectroscopy (HAXPES) is used to identify chemical interactions (such as elemental redistribution) at the buried silicon/aluminum-doped zinc oxide thin-film solar cell interface. Expanding our study of the interfacial oxidation of silicon upon its solid-phase crystallization (SPC), in which we found zinc oxide to be the source of oxygen, in this investigation we address chemical interaction processes involving zinc and aluminum. In particular, we observe an increase of zinc- and aluminum-related HAXPES signals after SPC of the deposited amorphous silicon thin films. Quantitative analysis suggests an elemental redistribution in the proximity of the silicon/aluminum-doped zinc oxide interface - more pronounced for aluminum than for zinc - as explanation. Based on these insights the complex chemical interface structure is discussed. © 2013 Elsevier B.V. All rights reserved.
Start page
309
End page
313
Volume
190
Issue
PART B
Language
English
OCDE Knowledge area
Recubrimiento, PelÃculas
Subjects
Scopus EID
2-s2.0-84890119723
Source
Journal of Electron Spectroscopy and Related Phenomena
ISSN of the container
03682048
Sponsor(s)
E. Conrad, M. Mertin and F. Schäfers are acknowledged for technical support. M.W., F.R., and J.H. thank the Federal Ministry for the Environment, Nature Conservation and Nuclear Safety ( No. 0327693H+A ) and R.G.W., D.G., R.F., and M.B. acknowledge the Helmholtz Association ( VH-NG-423 ) for financial support.
Sources of information:
Directorio de Producción CientÃfica
Scopus