Title
Localized states at GaN surfaces, Schottky barriers, and quantum well interfaces
Date Issued
01 June 2000
Access level
metadata only access
Resource Type
journal article
Author(s)
Brillson L.J.
Young A.P.
Levin T.M.
Jessen G.H.
Schäfer J.
Yang Y.
Xu S.H.
Cruguel H.
Lapeyre G.J.
Naoi Y.
Tu C.
McKenzie J.D.
Abernathy C.R.
Publisher(s)
Elsevier BV
Abstract
We have used low energy electron-excited nanoluminescence (LEEN) spectroscopy to probe the localized electronic states at GaN free surfaces, metal-GaN contacts, and GaN/InGaN quantum well interfaces. These depth-resolved measurements reveal the presence of deep electronic states near GaN interfaces whose energies and relative densities depend sensitively on the local chemical structure and growth conditions. The physical properties of these states correlate with mobility variations in thin GaN films grown by molecular beam epitaxy, Fermi level positions at Mg and Al/GaN Schottky barriers, and the appearance of new phases localized near GaN/InGaN/GaN quantum well interfaces. The growth and processing dependence of deep GaN levels highlights new methods to understand and control the fundamental electronic structure of GaN heterointerfaces. © 2000 Elsevier Science S.A. All rights reserved.
Start page
218
End page
223
Volume
75
Issue
March 2
Language
English
Subjects
Scopus EID
2-s2.0-33645803654
Source
Materials Science and Engineering B: Solid-State Materials for Advanced Technology
ISSN of the container
09215107
Sponsor(s)
The Ohio State University authors gratefully acknowledge support for this work by Department of Energy Grant # DE-FG0297ER45666 for the depth-dependent LEEN studies and National Science Foundation Grant # DMR-9711851 for the energy-dependent excitation calculations. We also thank Hewlett Packard Corporation for the quantum well specimens used here.
Sources of information:
Directorio de Producción CientÃfica
Scopus