Title
Graphene field effect transistors using TiO<inf>2</inf> as the dielectric layer
Date Issued
01 October 2020
Access level
metadata only access
Resource Type
journal article
Author(s)
Flores-Silva P.A.
Borja-Hernández C.
Magaña C.
Acosta D.R.
Botello-Méndez A.R.
Universidad Nacional Autónoma de México
Publisher(s)
Elsevier B.V.
Abstract
In this work, we report the electron mobility and electron density of three graphene field effect transistors using a 280 nm titanium dioxide dielectric layer and a graphene channel of area 300 × 300 μm2. We achieve electron mobilities up to 1877 cm2/V and the Dirac point appears in small gate voltages, as compared to similar SiO2 transistors. Also, we obtain the TiO2 surface roughness through profilometry and confirm that electron mobility is inversely proportional to the channel's surface roughness.
Volume
124
Language
English
OCDE Knowledge area
Física y Astronomía
Subjects
Scopus EID
2-s2.0-85086804806
Source
Physica E: Low-Dimensional Systems and Nanostructures
ISSN of the container
13869477
Sponsor(s)
We want to acknowledge financial support from PAPIIT IA102217, PIIF-17 and PIIF-18-4 projects. Also, we want to acknowledge Cristina Zorrilla and the Laboratorio de Materiales Avanzados for the Raman spectroscopy measurements, to Alejandro Esparza for the electrode sputtering deposits of Cr and Au, to Mathieu Hautefeuille and Diego Zamarrón for the vinyl masks lithography, to Maira Pérez for the design and printing of the mount for the GFETs, to Rodrigo Gutiérrez for the design of the GFET circuit, to Carlos Gardea for his electronic device advise, to the Laboratorio Central de Microscopia and their staff for the SEM images and finally, to Antonino Morales and the Laboratorio de Refinamiento de Estructuras Cristalinas for
Sources of information:
Directorio de Producción Científica
Scopus