Title
Near band-edge and excitonic behavior of GaAsN epilayers grown by chemical beam epitaxy
Date Issued
20 June 2005
Access level
metadata only access
Resource Type
conference paper
Author(s)
Bhusal L.
Zhu W.
Fotkatzikis A.
Pinault M.A.
Litvinchuk A.P.
Freundlich A.
University of Houston
Publisher(s)
Springer Nature
Abstract
Photoluminescence and absorption spectroscopy experiments were performed on as grown and thermally annealed GaAs1-xNx with nitrogen content in the range of 0.75-7.1%. At low temperature, the photoluminescence spectra exhibits two set of features: (i) a relatively broad peak at low energy and near to the vicinity of the predicted band gaps and (ii) a sharp excitonic feature at higher energy (about 100 meV for x>4%). Post growth thermal annealing processes systematically favor stronger excitonic emissions, and a notable intensity reduction of the deeper (defect related) luminescence. The low temperature binding energy of the higher energy excitonic peak is found to be consistent with the increase of the electronic effective masses. A careful examination of the data obtained in this work suggests that for higher nitrogen content (x>4%), the fundamental band gap of GaAsN is located at significantly higher energies than those commonly accepted for these alloys. © 2005 Materials Research Society.
Start page
505
End page
510
Volume
829
Language
English
OCDE Knowledge area
Ingeniería eléctrica, Ingeniería electrónica
Ingeniería de procesos
Scopus EID
2-s2.0-20344398177
Source
Materials Research Society Symposium Proceedings
ISSN of the container
19464274
Conference
Progress in Compound Semiconductor Materials IV - Electronic and Optoelectronic Applications 29 November 2004 through 3 December 2004
Sources of information:
Directorio de Producción Científica
Scopus