Title
Honeycomb micro-textures for light trapping in multi-crystalline silicon thin-film solar cells
Date Issued
14 May 2018
Access level
open access
Resource Type
journal article
Author(s)
Eisenhauer D.
Sai H.
Matsui T.
Ppel G.K.
Becker C.
Helmholtz-Zentrum Berlin für Materialien und Energie GmbH
Publisher(s)
OSA - The Optical Society
Abstract
The liquid phase crystallization (LPC) of silicon is an emerging technology for fabricating 10 − 20 µm thin multi-crystalline silicon layers on glass. LPC silicon solar cells exhibit similar electronic performance to multi-crystalline wafer-based devices. Due to the reduced absorber thickness, however, e ective measures for light trapping have to be taken. We present tailor-made micro-structures for light trapping at the LPC silicon back-side, whereby a nano-imprinted resist layer serves as a three-dimensional etching mask in subsequent reactive ion etching. Contrary to state-of-the-art random pyramid textures produced by wet-chemical etching, this method allows to produce tailor-made textures independent of grain orientation. Di erently shaped micro-textures were replicated in LPC silicon. Absorptance and external quantum e ciency of periodic honeycomb patterns and random pyramids were found to be equivalent. Thus, the method enables the potential to further optimize light trapping in LPC silicon solar cells.
Start page
A498
End page
A507
Volume
26
Issue
10
Language
English
OCDE Knowledge area
Ingeniería de materiales
Scopus EID
2-s2.0-85047335945
PubMed ID
Source
Optics Express
ISSN of the container
10944087
Sponsor(s)
Funding text 1 The authors thank M. Krüger, M. Muske, I. Rudolph, and C. Klimm for their support with experimental work and SEM imaging. GP Solar is acknowledged for providing the Alkatex IPA-free texturing agent. Part of the photolithography process was conducted at the AIST Nano-Processing Facility, supported by the ”Nanotechnology Network Japan” of the Ministry of Education, Culture, Sports, Science and Technology, Japan (MEXT). K. Masuda is ackknowledged for his assistance in photolithography. Funding text 2 Bundesministerium für Bildung und Forschung (501100002347) (No. 03X5520). The authors thank M. Krüger, M. Muske, I. Rudolph, and C. Klimm for their support with experimental work and SEM imaging. GP Solar is acknowledged for providing the Alkatex IPA-free texturing agent. Part of the photolithography process was conducted at the AIST Nano-Processing Facility, supported by the”Nanotechnology Network Japan” of the Ministry of Education, Culture, Sports, Science and Technology, Japan (MEXT). K. Masuda is ackknowledged for his assistance in photolithography. National Institute of Advanced Industrial Science and Technology - AIST
Sources of information: Directorio de Producción Científica Scopus