An atomic force microscope was used to analyze the surface morphology evolution caused by the annealing process of LiCoOx thin films resulting from rf sputtering. The atomic force microscope proved efficient in showing a clear transition from amorphous structures to crystalling structures, a transition characterized by a correlation length related to the effective radius of the crystalline domain, which notably rises as the annealing temperature escalates. The examination also suggested that a diffusional process can effectively describe the roughness exponent for the as-grown film as well as the internal morphology.