The simulation, fabrication and characterization of ARROW waveguides using dielectric films deposited by Plasma Enhanced Chemical Vapor Deposition (PECVD) and Sputtering techniques, are presented in this work. Amorphous titanium oxide (TiO2) films were used as first cladding layer and silicon oxynitride (SiOxNy) films, as core and second cladding layers. Furthermore, homemade routines based in two computational methods were developed, for numerical simulations: Transfer Matrix Method (TMM) for the determination of the optimum thickness values of the Fabry-Perot layers, and the Finite Difference Method (FDM) for 2D design and determination of the maximum width that allows single-mode operation. The utilization of titanium oxide as first anti-resonant layer resulted in low optical attenuations, since high interlayer refractive index differences can be obtained. © The Electrochemical Society.