Title
Spatial variation of luminescence in thick GaN films
Date Issued
26 February 2001
Access level
metadata only access
Resource Type
journal article
Author(s)
Bertram F.
Srinivasan S.
Riemann T.
Christen J.
Molnar R.
Abstract
The spatial variation of the optical properties of hydride vapor-phase epitaxial GaN layers of various thickness has been studied using scanning cathodoluminescence microscopy. A strong improvement of these properties with film thickness is observed in plan view. Cross-sectional studies show a strong redshift of the luminescence in the vicinity of the substrate within a typical thickness of about 2 μm, reflecting a high local impurity content. Above this initial growth region, a strong blueshift is observed up to the energy of fully relaxed high-purity GaN, indicating vertical strain relaxation as well as depletion of residual donors. This is accompanied by a sharp increase in the lateral spectral homogeneity, indicative of a significant improvement in crystalline quality. © 2001 American Institute of Physics.
Start page
1222
End page
1224
Volume
78
Issue
9
Language
English
OCDE Knowledge area
Física de la materia condensada
Scopus EID
2-s2.0-0001091792
Source
Applied Physics Letters
ISSN of the container
00036951
Sources of information: Directorio de Producción Científica Scopus