Title
Misfit strain relaxation in m -plane epitaxy of InGaN on ZnO
Date Issued
01 March 2010
Access level
metadata only access
Resource Type
journal article
Author(s)
Wu Z.
Sun K.
Wei Q.
Fischer A.
Kawai Y.
Iwaya M.
Kamiyama S.
Amano H.
Akasaki I.
Abstract
The microstructure of m -plane InGaN epilayers grown on m -plane ZnO has been found to depend significantly on indium composition for the range from 0.07 to 0.17, where anisotropic lattice mismatch between InGaN and ZnO results in decreasingly tensile and increasingly compressive stress along the a and c lattice axes, respectively. For indium compositions below ∼0.10, periodic arrays of misfit dislocations with a Burgers vector of 1/3 [11 2- 0] are observed parallel to the [0001] direction. For indium compositions above ∼0.12, generation of basal-plane stacking faults relieve the compressive stress along the [0001] direction. These characteristic mechanisms of strain relaxation should provide new approaches to engineer thick InGaN layers with reduced lattice misfit strain. © 2010 American Institute of Physics.
Volume
96
Issue
7
Language
English
OCDE Knowledge area
Física atómica, molecular y química
Scopus EID
2-s2.0-77249149447
Source
Applied Physics Letters
ISSN of the container
00036951
Sponsor(s)
Research at Arizona State University was supported by Nichia Corporation.
Sources of information: Directorio de Producción Científica Scopus