Title
Investigation of band tailing in sputtered ZnO:Al thin films regarding structural properties and impurities
Date Issued
01 January 2014
Access level
metadata only access
Resource Type
conference paper
Author(s)
Institute for Silicon Photovoltaics
Publisher(s)
Materials Research Society
Abstract
Thin films of pure aluminum doped ZnO and with addition of nitrogen, oxygen and hydrogen have been prepared by magnetron sputtering. The spectral absorption coefficient close to the band gap energy has been determined by spectrophotometry and analyzed regarding band tailing and creation of defect bands. We found, that an improvement of Raman crystallinity under O2- rich growth conditions is not accompanied by a suppression of band tailing as expected. An additional absorption feature evolves for layers grown in N2 containing atmosphere. Doping with hydrogen attenuates sub-band gap absorption.
Volume
1699
Language
English
OCDE Knowledge area
Recubrimiento, Películas
Subjects
Scopus EID
2-s2.0-84924370610
Source
Materials Research Society Symposium Proceedings
ISSN of the container
02729172
Conference
2014 MRS Spring Meeting
Sources of information:
Directorio de Producción Científica
Scopus