Title
ITO-free metallization for interdigitated back contact silicon heterojunction solar cells
Date Issued
01 January 2017
Access level
open access
Resource Type
journal article
Author(s)
Stang J.C.
Hendrichs M.S.
Merkle A.
Peibst R.
Stannowski B.
Korte L.
Institute Silicon Photovoltaics, Kekuléstr. 5, Berlin
Publisher(s)
Elsevier Ltd
Abstract
We report on two different approaches to fabricate interdigitated back contact silicon heterojunction solar cells without using indium tin oxide (ITO). The standard ITO/Ag backend is either modified by replacing ITO with aluminum-doped zinc oxide (AZO) or completely replaced by a sole aluminum (Al) layer. The very transparent AZO enhances the optical properties at the rear side resulting in an increase in short-circuit current density. The efficiency of the AZO cells remains on the level of the ITO ones, as the fill factor drops slightly. On the contrary, the contact resistivity of annealed Al, in comparison to ITO and AZO, to the emitter and BSF layers is much lower, thus the fill factor is increased. Despite lower open circuit voltages, cells with Al achieve efficiencies of up 22 %, a gain of 0.5 %abs compared to the ITO reference.
Start page
379
End page
383
Volume
124
Language
English
OCDE Knowledge area
Física atómica, molecular y química
Scopus EID
2-s2.0-85031894987
Source
Energy Procedia
ISSN of the container
18766102
Sponsor(s)
This work was supported by the European Union’s Horizon 2020 Programme for research, technological development and demonstration under grant agreement no. 727523 (project NextBase). Furthermore, the authors thank P. Wagner, H. Rhein, E. Conrad, M. Wittig, K. Jacob, M. Hartig, H. Kohlenberg, and T. Friedrich for their support in fabricating the solar cells.
Sources of information: Directorio de Producción Científica Scopus