Title
Preparation of Semi-Insulating Silicon Carbide by Vanadium Doping during PVT Bulk Crystal Growth
Date Issued
01 January 2003
Access level
metadata only access
Resource Type
conference paper
Author(s)
University of Erlangen-Nürnberg
Publisher(s)
Trans Tech Publications Ltd
Abstract
To fabricate semi-insulating SiC bulk crystals, vanadium doping was performed by adding vanadium as a solid source to the SiC starting material. Electrical and optical properties of the PVT grown crystals were investigated. The nitrogen concentration up to about 2 × 1018 cm -3 in the crystal areas near the seed as well as the maximum solubility of vanadium in SiC of about 5 × 1017 cm -3 are limiting yield and electrical homogeneity of vanadium doped SiC bulk crystals. Depletion of vanadium during growth can be prevented by lowering the growth temperature or using an inner container filled with a SiC/VC-mixture leading to a homogeneous vanadium incorporation in the crystals. Co-doping of vanadium and boron was successfully performed to attain SiC crystals with a fermi level close to mid-gap, leading to thermal activation energies up to about 1,7 eV. The V3+ and V4+ charge states of vanadium can be detected separately using optical absorption or electron spin resonance (ESR). With these techniques the electrical domination of the V3+/V4+ acceptor or the V4+/V 5+ donor level in V doped samples can be determined.
Start page
51
End page
54
Volume
433-436
Language
English
OCDE Knowledge area
Ingeniería de materiales
Subjects
Scopus EID
2-s2.0-0242497064
Source
Materials Science Forum
Resource of which it is part
Materials Science Forum
ISSN of the container
02555476
ISBN of the container
978-087849920-5
Conference
Proceedings of the 4th European Conference on Silicon Carbide and Related Materials
Sources of information:
Directorio de Producción Científica
Scopus