Title
Thickness dependence of the optical properties of sputter deposited Ti oxide films
Date Issued
03 April 2000
Access level
metadata only access
Resource Type
journal article
Author(s)
Uppsala University
Uppsala University
Publisher(s)
Elsevier Sequoia SA
Abstract
Amorphous and crystalline Ti oxide films were obtained by reactive magnetron sputtering onto substrates at different temperatures. Optical constants of the films were determined from spectrophotometric measurements of reflectance and transmittance. The amorphous films had a band gap of approximately 3.4 eV and a wide absorption tail extending to lower energies. The crystalline films displayed a band gap of 3.3-3.35 eV and a more narrow absorption tail. The optical constants were dependent on film thickness. The crystalline films showed evidence of structural inhomogeneities leading to diffuse scattering in the thicker films as well as to a grading of the refractive index.
Start page
119
End page
125
Volume
365
Issue
1
Language
English
OCDE Knowledge area
Física de partículas, Campos de la Física
Ingeniería eléctrica, Ingeniería electrónica
Subjects
Publication version
Version of Record
Scopus EID
2-s2.0-0343022269
Source
Thin Solid Films
ISSN of the container
00406090
Sources of information:
Directorio de Producción Científica
Scopus