Title
Sputter-deposited Ti oxide films used for photoelectrocatalytic degradation of 4-chlorophenol
Date Issued
01 August 2001
Access level
metadata only access
Resource Type
journal article
Author(s)
Uppsala University
Uppsala University
Publisher(s)
Springer Nature
Abstract
Ti oxide films were made by reactive magnetron sputtering under conditions yielding "penniform" structures with large porosity. X-ray diffractometry showed that rutile-like and anatase-like films were produced depending on the oxygen content in the sputter plasma. Rutherford backscattering spectrometry documented some oxygen overstoichiometry. Spectral optical measurements were used to analyze the absorption around the fundamental band gap and to give evidence of some hydration and hydroxylation in the films. The various Ti oxide films were brought in contact with 4-chlorophenol (4-CP), whose photo-electrocatalytically induced degradation under ultraviolet irradiation was investigated in a reactor allowing optical probing of 4-CP as well as of intermediate reaction products such as benzoquinone. A rutile-like structure was conducive to the degradation of 4-CP, which can be reconciled with the band gap being suitable for producing photoinduced holes capable to effecting oxidation of the pollutan t. © 2001 Kluwer Academic Publishers.
Start page
3699
End page
3705
Volume
36
Issue
15
Language
English
OCDE Knowledge area
Ingeniería de materiales
Subjects
Publication version
Version of Record
Scopus EID
2-s2.0-0035419951
Source
Journal of Materials Science
ISSN of the container
00222461
Sources of information:
Directorio de Producción Científica
Scopus