Title
Annealing of amorphous and nanocrystalline AlN and GaN films and photoluminescence of Tb<sup>3+</sup> centers
Date Issued
01 January 2006
Access level
metadata only access
Resource Type
conference paper
Author(s)
Universität Erlangen-Nürnberg
Publisher(s)
Elsevier
Abstract
The luminescence due to rare earth ions in Al and Ga nitride thin layers can be increased by proper structural tailoring. In this contribution, we report on the photoluminescence of the rare earth ion Tb3+ that is contained in films prepared by DC magnetron co-sputtering of Ga or Al targets with additional Tb pellets in a nitrogen atmosphere. These results are typical also for other rare earth ions, such as Eu3+, Sm3+, Tm3+ and Ce3+. Thermal annealing of the samples results in significant improvement of the photoluminescence by factors up to several tens in intensity. Interestingly enough, optimum intensity is achieved with annealing temperatures in a window between approximately 500 and 750 °C in all cases. This finding indicates similar excitation and emission processes based on structural properties of the layers.
Start page
794
End page
796
Volume
28
Issue
July 6
Language
English
OCDE Knowledge area
Óptica
Scopus EID
2-s2.0-33644924606
Source
Optical Materials
ISSN of the container
09253467
Sponsor(s)
Funding text
We would like to thank the Institute for Electrical Engineering Materials of Erlangen-Nuremberg University for the possibility to use its photoluminescence equipment. This work was partially funded by the German Academic Exchange Service (project 415-br-probral/ale-03/23561).
Sources of information:
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