Title
Field-effect passivation and degradation analyzed with photoconductance decay measurements
Date Issued
12 May 2014
Access level
metadata only access
Resource Type
journal article
Author(s)
Chen Y.Y.
Hsin P.Y.
Leendertz C.
Korte L.
Du C.H.
Gan J.Y.
Institute for Silicon-Photovoltaics
Publisher(s)
American Institute of Physics Inc.
Abstract
In this article, an expression for the surface passivation has been derived in terms of the surface recombination velocity and the field-effect exponential. The analytical solutions provide a comprehensive understanding of the injection dependency of minority charge carrier lifetime as measured by photoconductance decay. The model has been utilized to analyze the field-effect passivation of silicon exerted by the fixed dielectric charge in an overlying dielectric film. Possible limitations and restrictions of the technique are also addressed. © 2014 AIP Publishing LLC.
Volume
104
Issue
19
Language
English
OCDE Knowledge area
Física y Astronomía Recubrimiento, Películas
Scopus EID
2-s2.0-84900854451
Source
Applied Physics Letters
ISSN of the container
00036951
Sources of information: Directorio de Producción Científica Scopus