Title
Lowerature Ohmic Contact to Monolayer MoS<inf>2</inf> by van der Waals Bonded Co/h-BN Electrodes
Date Issued
09 August 2017
Access level
metadata only access
Resource Type
research article
Author(s)
Cui X.
Shih E.M.
Chae S.H.
Kim Y.D.
Li B.
Seo D.
Pistunova K.
Yin J.
Park J.H.
Choi H.J.
Lee Y.H.
Watanabe K.
Taniguchi T.
Kim P.
Dean C.R.
Hone J.C.
Harvard University
Abstract
Monolayer MoS2, among many other transition metal dichalcogenides, holds great promise for future applications in nanoelectronics and optoelectronics due to its ultrathin nature, flexibility, sizable band gap, and unique spin-valley coupled physics. However, careful study of these properties at low temperature has been hindered by an inability to achieve lowerature Ohmic contacts to monolayer MoS2, particularly at low carrier densities. In this work, we report a new contact scheme that utilizes cobalt (Co) with a monolayer of hexagonal boron nitride (h-BN) that has the following two functions: modifies the work function of Co and acts as a tunneling barrier. We measure a flat-band Schottky barrier of 16 meV, which makes thin tunnel barriers upon doping the channels, and thus achieve low-T contact resistance of 3 kÎ.μm at a carrier density of 5.3 × 1012/cm2. This further allows us to observe Shubnikov-de Haas oscillations in monolayer MoS2 at much lower carrier densities compared to previous work.
Start page
4781
End page
4786
Volume
17
Issue
8
Language
English
OCDE Knowledge area
Nano-materiales
Scopus EID
2-s2.0-85027166327
PubMed ID
Source
Nano Letters
ISSN of the container
15306984
Sources of information: Directorio de Producción Científica Scopus