Title
High AI-doping of SiC using a modified PVT (M-PVT) growth set-up
Date Issued
01 January 2005
Access level
metadata only access
Resource Type
conference paper
Author(s)
University of Erlangen-Nürnberg
Publisher(s)
Trans Tech Publications Ltd
Abstract
Several highly aluminum doped SiC bulk crystals were grown with a modified PVT (M-PVT) method. To facilitate 4H-SiC formation, growth was conducted on the C-face. The samples were investigated using Hall measurements in the Van-der-Pauw geometry. Lowest room temperature values for specific resistivities were 0.09 Ωcm for 6H-SiC and 0.2 Ωcm for 4H-SiC, which are to our knowledge the lowest values yet reported in literature. Thus, resistivity values of < 0.2 Ωcm, which are required for substrates in high power device applications, could be demonstrated for 4H-SiC. Remarkably, in very highly doped samples the type of conduction could not be determined by Hall measurements.
Start page
31
End page
34
Volume
483-485
Language
English
OCDE Knowledge area
Ingeniería de materiales
Subjects
Scopus EID
2-s2.0-33646245258
Source
Materials Science Forum
ISSN of the container
02555476
ISBN of the container
0878499636, 978-087849963-2
Conference
5th European Conference on Silicon Carbide and Related Materials, ECRSCRM2004
Sources of information:
Directorio de Producción Científica
Scopus