Title
Light emission in forward and reverse bias operation in OLED with amorphous silicon carbon nitride thin films
Date Issued
01 January 2011
Access level
open access
Resource Type
conference paper
Author(s)
Publisher(s)
Institute of Physics Publishing
Abstract
Amorphous silicon carbon nitride (a-SiC:N) thin films deposited by magnetron sputtering were used in the structure of an organic light emitting diode (OLED), obtaining an OLED operating in forward and reverse bias mode. The device consist of the heterojunction structure ITO/a-SiC:N/Hole Transport Layer (HTL)/ Electron Transport Layer (ETL)/a-SiC:N/Al. As hole transporting layer was used a thin film of 1-(3-methylphenyl)-1,2,3,4 tetrahydroquinoline - 6 - carboxyaldehyde - 1,1'- diphenylhydrazone (MTCD), while the tris(8- hydroxyquinoline aluminum) (Alq3) is used as electron transport and emitting layer. A significant increase in the voltage operation compared to the conventional ITO/MTCD/Alq3/Al structure was observed, so the onset of electroluminescence occurs at about 22 V in the forward and reverse bias mode of operation. The electroluminescence spectra is similar in both cases, only slightly shifted 0.14 eV to lower energies in relation to the conventional device.
Volume
274
Issue
1
Language
English
OCDE Knowledge area
Ingeniería de materiales
Física y Astronomía
Subjects
Scopus EID
2-s2.0-79953758254
Source
Journal of Physics: Conference Series
ISSN of the container
17426588
Sources of information:
Directorio de Producción Científica
Scopus