Title
Amorphous carbon nitride thin films as electron injection layer in organic LEDs
Date Issued
30 January 2004
Access level
metadata only access
Resource Type
conference paper
Author(s)
Universidad Federal do Rio de Janeiro
Abstract
Thin films of a-C:N and a-SiC:N deposited by diode r.f. sputtering and magnetron sputtering, respectively, were used as electron injection layers in organic light emitting diodes. The devices consist of two different heterojunction structures: the first one, indium tin oxide (ITO)/hole transport layer (HTL)/electron transport layer (ETL)/a-C:N/Al and the other one formed by ITO/HTL/ETL/a-SiC:N/Al. The HTL was obtained using a thin film of 1-(3-methylphenyl)-1,2,3,4 tetrahydroquinoline-6-carboxyaldehyde-1,1′-diphenylhydrazone (MTCD), while the tris(8-hydroxyquinoline aluminum) (Alq3) is used as ETL. For all produced devices a significant increase in the current compared to the conventional ITO/MTCD/Alq3/Al structure was observed. Light emission was detected in both ITO/MTCD/Alq3/a-C:N/Al and ITO/MTCD/Alq 3/a-SiC:N/Al structures. The results are interpreted in terms of a highly efficient electron injection from the carbon nitride layer into the electron transporting one. The electroluminescent spectra of the devices are also reported and discussed. © 2003 Elsevier B.V. All rights reserved.
Start page
74
End page
79
Volume
447-448
Language
English
OCDE Knowledge area
Física y Astronomía
Química
Subjects
Scopus EID
2-s2.0-1342344917
Source
Thin Solid Films
ISSN of the container
00406090
Conference
Proceedings of the 30th International Conference on Metallurgie
Sponsor(s)
The authors wish to acknowledge Prof. Sung-Hoon Kim of the Department of Dyeing and Finishing, of the Kyunpook National University (South Korea), for the MTCD material. This work was supported by RENAMI, CNPq, CAPES, FAPERJ and FAPESP.
Sources of information:
Directorio de Producción Científica
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