Title
Strain relaxation mechanisms in AlGaN epitaxy on AlN templates
Date Issued
01 November 2010
Access level
metadata only access
Resource Type
journal article
Author(s)
Wu Z.
Nonaka K.
Kawai Y.
Asai T.
Chen C.
Iwaya M.
Kamiyama S.
Amano H.
Akasaki I.
Abstract
Two strain relaxation processes have been observed in AGaN layers grown on thick AlN templates. In Process I, a-type threading dislocations (TDs) with b = 1/3(112̄0) from the AlN underlayer are inclined away from the [0001] axis toward the (11̄00) directions when they enter the AlGaN film, forming dislocation line projection perpendicular to the Burger vector. In Process II, a + c-type TDs from the AlN underlayer with Burgers vector of b = 1/3(112̄3) glide on (01̄11) planes when they enter the AlGaN film to generate interfacial misfit dislocations lying along the (2̄110) directions at the AlGaN/AlN interface. © 2010 The Japan Society of Applied Physics.
Volume
3
Issue
11
Language
English
OCDE Knowledge area
Física de partículas, Campos de la Física
Scopus EID
2-s2.0-78549242628
Source
Applied Physics Express
ISSN of the container
18820778
Sources of information: Directorio de Producción Científica Scopus