Title
New materials and deposition techniques for highly efficient silicon thin film solar cells
Date Issued
01 January 2002
Access level
metadata only access
Resource Type
journal article
Author(s)
Kluth O.
Repmann T.
Roschek T.
Springer J.
Müller J.
Finger F.
Stiebig H.
Wagner H.
Forschungszentrum Jülich GmbH
Publisher(s)
Elsevier
Abstract
This paper reviews recent efforts to provide the scientific and technological basis for cost-effective and highly efficient thin film solar modules based on amorphous (a-Si:H) and microcrystalline (μc-Si:H) silicon. Textured ZnO:Al films prepared by sputtering and wet chemical etching were applied to design optimised light-trapping schemes. Necessary prerequisite was the detailed knowledge of the relationship between film growth, structural properties and surface morphology obtained after etching. High rate deposition using plasma enhanced chemical vapour deposition at 13.56 MHz plasma excitation frequency was developed for μc-Si:H solar cells yielding efficiencies of 8.1% and 7.5% at deposition rates of 5 and 9 Å/s, respectively. These μc-Si:H solar cells were successfully up-scaled to a substrate area of 30 × 30 cm2 and applied in a-Si:H/μc-Si:H tandem cells showing initial test cell efficiencies up to 11.9%. © 2002 Elsevier Science B.V. All rights reserved.
Start page
439
End page
447
Volume
74
Issue
April 1
Language
English
OCDE Knowledge area
Recubrimiento, Películas Óptica
Scopus EID
2-s2.0-0036778583
Source
Solar Energy Materials and Solar Cells
ISSN of the container
09270248
Sponsor(s)
The authors thank their colleagues at the IPV for providing excellent technical and scientific support. We gratefully acknowledge financial support from the BMBF, the BMWi (contracts: 0329885 and 0329854A), RWE Solar GmbH and the European Commission (contract: ENK6-CT-2000-00321).
Sources of information: Directorio de Producción Científica Scopus