A device for the manufacture of thin films by coating was constructed by centrifugation (spin coating). A timer motor was used to control the constant speeds of 1000 to 6000 rpm for 100 s. which were measured with an optical tachometer. TiO2 films manufactured by the team were deposited on three different substrates (ITO, Si and glass), annealed at 500 ° C after the tenth layer, in order to improve their structure. The films were characterized by a scanning electron microscope (MEB), X-ray diffractogram (DRX) and Fourier transform Infrared (FTIR). The DRX shows that all films have pure anatase structure, with a preferential growth in the peak (101), the FTIR shows the vibration mode in the 433 cm-1 peak belonging to the anatase phase. The results of the MEB show the thicknesses of the films are in the order of nanometers, the TiO2 films deposited on Si those having a thickness of 332.10 nm, less than half compared to the other two. It is concluded that it was possible to build a low-cost spin coating equipment verified with the manufacture of uniform TiO2 films.