Title
Microwave absorption of electroplated NiFeCu/Cu multilayers deposited directly on Si (100) substrates
Date Issued
15 December 2016
Access level
metadata only access
Resource Type
journal article
Author(s)
Centro Brasileiro de Pesquisas Físicas
Publisher(s)
Elsevier B.V.
Abstract
We study the magnetic properties and broadband microwave absorption of electroplated NiFeCu/Cu multilayered thin films deposited directly on Si (100) substrates. We produced samples with 20 nm thick NiFeCu layers and Cu layer thickness tCu in the range 0–2.8 nm. Structural properties were studied by grazing incidence X-ray diffraction (GIXRD), while the composition and morphological aspects were studied by scanning electron microscopy (SEM) and energy dispersive X-ray spectroscopy (EDX). GIXRD confirmed the cubic face centered FCC phase of NiFeCu with all diffraction peaks drifting toward lower angles with tCu. SEM images show the appearance of Cu islands instead of continuous Cu layers. A minimum coercive field of 1.4 Oe is obtained for tCu=1.0nm, while the ferromagnetic resonance linewidth exhibited 200 Oe constant values for tCu between 0.7 and 2.1 nm. The effective magnetization increases with tCu, possibly associated to the increase on Fe content as observed by EDX. The effective dynamic anisotropy behavior with tCu seems to be associated to the island structure observed in the films.
Start page
23
End page
27
Volume
420
Language
English
OCDE Knowledge area
Ingeniería eléctrica, Ingeniería electrónica
Subjects
Scopus EID
2-s2.0-84978252644
Source
Journal of Magnetism and Magnetic Materials
ISSN of the container
03048853
Sponsor(s)
This work has been supported by the Brazilian agencies CNPq , FAPERJ and CAPES .
Sources of information:
Directorio de Producción Científica
Scopus