cris.boxmetadata.label.title
Determination of the optical bandgap of thin amorphous (SiC) 1-x(AlN)x films
cris.boxmetadata.label.dateissued
01 browse.startsWith.months.january 2010
cris.boxmetadata.label.accesslevel
metadata only access
cris.boxmetadata.label.resourcetype
conference paper
cris.boxmetadata.label.publisher
Trans Tech Publications Ltd
cris.boxmetadata.label.abstract
Amorphous wide bandgap semiconductor thin films of the pseudobinary compound (SiC)1-x(AlN)x were grown by radio frequency dual magnetron sputtering on CaF2, MgO and glass substrates. We performed isochronical annealing steps up to 500°C. The optical bandgap is determined for each composition from spectroscopic transmission measurement in two different ways: according to Tauc and using the (ahv)2 plot. The dependence of the optical bandgap on the composition x can be described by Vegard's empirical law for alloys. © (2010) Trans Tech Publications.
cris.boxmetadata.label.citationstartpage
263
cris.boxmetadata.label.citationendpage
266
cris.boxmetadata.label.volume
645-648
cris.boxmetadata.label.language
English
cris.boxmetadata.label.ocdeknowledgeArea
Óptica
cris.boxmetadata.label.doi
cris.boxmetadata.label.scopusidentifier
2-s2.0-77955464779
cris.boxmetadata.label.source
Materials Science Forum
cris.boxmetadata.label.partofresource
Materials Science Forum
cris.boxmetadata.label.containerissn
02555476
cris.boxmetadata.label.containerisbn
0878492798
cris.boxmetadata.label.conference
13th International Conference on Silicon Carbide and Related Materials 2009, ICSCRM 2009
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